Effects of oxygen and substrate temperature on properties of amorphous carbon films fabricated by plasma-assisted pulsed laser deposition method

被引:0
|
作者
Ono, Tomoyuki [1 ]
Suda, Yoshiyuki [1 ]
Akazawa, Masamichi [2 ]
Sakai, Yosuke [1 ]
Suzuki, Kaoru [2 ]
机构
[1] Graduate School of Engineering, Hokkaido University, North 13 West 8, Sapporo 060-8628, Japan
[2] Department of Electrical Engineering, College of Science and Technology, Nihon University, Tokyo 101-8308, Japan
关键词
D O I
暂无
中图分类号
学科分类号
摘要
15
引用
收藏
页码:4651 / 4654
相关论文
共 50 条
  • [41] Effects of substrate parameters on structure and optical properties of ZnO thin films fabricated by pulsed laser deposition
    Wei, X. Q.
    Huang, J. Z.
    Zhang, M. Y.
    Du, Y.
    Man, B. Y.
    MATERIALS SCIENCE AND ENGINEERING B-ADVANCED FUNCTIONAL SOLID-STATE MATERIALS, 2010, 166 (02): : 141 - 146
  • [42] Growth and properties of KNbO3 thin films prepared by microwave plasma-assisted pulsed laser deposition
    Yeo, JS
    Huang, TF
    Hammond, RH
    Hesselink, L
    INTEGRATED THIN FILMS AND APPLICATIONS, 1998, 86 : 101 - 108
  • [43] High temperature growth of InN on various substrates by plasma-assisted pulsed laser deposition
    Stokker-Cheregi, F.
    Nedelcea, A.
    Filipescu, M.
    Moldovan, A.
    Colceag, D.
    Ion, V.
    Birjega, R.
    Dinescu, M.
    APPLIED SURFACE SCIENCE, 2011, 257 (12) : 5312 - 5314
  • [44] Optical and hall properties of ZnO thin films fabricated by using the pulsed laser deposition method at various oxygen pressures and substrate temperatures
    Kang, Seong-Jun
    Shin, Hyun-Ho
    Yoon, Yung-Sup
    JOURNAL OF THE KOREAN PHYSICAL SOCIETY, 2007, 51 (01) : 183 - 188
  • [45] Dielectric properties of nickel containing hydrogenated amorphous carbon films prepared by microwave plasma-assisted deposition technique
    Sylvestre, A.
    Kukietka, S.
    Nguyen, D. M.
    Gulbinski, W.
    Pauleau, Y.
    REVIEWS ON ADVANCED MATERIALS SCIENCE, 2007, 15 (03) : 185 - 191
  • [46] Field emission properties of amorphous GaN ultrathin films fabricated by pulsed laser deposition
    Wang FengYing
    Wang RuZhi
    Zhao Wei
    Song XueMei
    Wang Bo
    Yan Hui
    SCIENCE IN CHINA SERIES F-INFORMATION SCIENCES, 2009, 52 (10): : 1947 - 1952
  • [47] Field emission properties of amorphous GaN ultrathin films fabricated by pulsed laser deposition
    FengYing Wang
    RuZhi Wang
    Wei Zhao
    XueMei Song
    Bo Wang
    Hui Yan
    Science in China Series F: Information Sciences, 2009, 52 : 1947 - 1952
  • [49] Thermoelectric properties of amorphous zinc oxide thin films fabricated by pulsed laser deposition
    Inoue, Y
    Okamoto, M
    Kawahara, T
    Okamoto, Y
    Morimoto, J
    MATERIALS TRANSACTIONS, 2005, 46 (07) : 1470 - 1475
  • [50] Substrate temperature and laser fluence effects on properties of ZnO thin films deposited by pulsed laser deposition
    Abdel-Fattah, E.
    Elsayed, I. A.
    Fahmy, T.
    JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS, 2018, 29 (23) : 19942 - 19950