FORMATION OF UNIFORM SOLID-PHASE EPITAXIAL CoSi2 FILMS BY PATTERNING METHOD.

被引：0
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作者：
Ishibashi, Kouichirou [1 ]
Furukawa, Seijiro [1 ]
机构：
[1] Tokyo Inst of Technology, Graduate, Sch of Science & Engineering,, Yokohama, Jpn, Tokyo Inst of Technology, Graduate Sch of Science & Engineering, Yokohama, Jpn
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes | 1985年 / 24卷 / 08期
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摘要：
COBALT SILICON ALLOYS
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页码：912 / 917
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