Fabrication and characterization of novel lateral surface superlattice structure utilizing Schottky barrier height control by doped silicon interface control layers

被引:0
|
作者
Hokkaido Univ, Sapporo, Japan [1 ]
机构
关键词
Computer simulation - Electric current measurement - Electrons - Field effect transistors - Induced currents - Light modulation - Oscillations - Semiconducting silicon - Semiconductor device manufacture - Surfaces - Transconductance - Voltage measurement;
D O I
暂无
中图分类号
学科分类号
摘要
引用
收藏
相关论文
共 40 条
  • [31] Novel InP metal-insulator-semiconductor structure having an ultrathin silicon interface control layer
    Takahashi, H
    Hashizume, T
    Hasegawa, H
    APPLIED SURFACE SCIENCE, 1998, 123 : 615 - 618
  • [32] Novel InP metal-insulator-semiconductor structure having an ultrathin silicon interface control layer
    Takahashi, Hiroshi
    Hashizume, Tamotsu
    Hasegawa, Hideki
    Applied Surface Science, 1998, 123-124 : 615 - 618
  • [33] Carrier density control of Sb-doped rutile-type SnO2 thin films and fabrication of a vertical Schottky barrier diode
    Takahashi, Yui
    Takane, Hitoshi
    Izumi, Hirokazu
    Wakamatsu, Takeru
    Isobe, Yuki
    Kaneko, Kentaro
    Tanaka, Katsuhisa
    APPLIED PHYSICS EXPRESS, 2024, 17 (04)
  • [34] Photoluminescence characterization of air exposed AlGaAs surface and passivated ex situ by ultrathin silicon interface control layer
    Adamowicz, Boguslawa
    Ikeya, Kengo
    Mutoh, Morimichi
    Saitoh, Toshiya
    Fujikura, Hajime
    Hasegawa, Hideki
    Physica E: Low-Dimensional Systems and Nanostructures, 1998, 2 (1-4): : 261 - 266
  • [35] Photoluminescence characterization of air exposed AlGaAs surface and passivated ex situ by ultrathin silicon interface control layer
    Adamowicz, B
    Ikeya, K
    Mutoh, M
    Saitoh, T
    Fujikura, H
    Hasegawa, H
    PHYSICA E-LOW-DIMENSIONAL SYSTEMS & NANOSTRUCTURES, 1998, 2 (1-4): : 261 - 266
  • [36] Optimization of novel oxide-free insulated gate structure for InP having an ultrathin silicon interface control layer
    Fu, ZW
    Takahashi, H
    Hashizume, T
    Kasai, S
    Hasegawa, H
    2001 INTERNATIONAL CONFERENCE ON INDIUM PHOSPHIDE AND RELATED MATERIALS, CONFERENCE PROCEEDINGS, 2001, : 413 - 416
  • [37] Novel surface passivation scheme for compound semiconductor using silicon interface control layer and its application to near-surface quantum wells
    Kodama, Satoshi
    Koyanagi, Satoshi
    Hashizume, Tamotsu
    Hasegawa, Hideki
    Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes & Review Papers, 1995, 34 (2 B): : 1143 - 1148
  • [38] NOVEL SURFACE PASSIVATION SCHEME FOR COMPOUND SEMICONDUCTOR USING SILICON INTERFACE CONTROL LAYER AND ITS APPLICATION TO NEAR-SURFACE QUANTUM-WELLS
    KODAMA, S
    KOYANAGI, S
    HASHIZUME, T
    HASEGAWA, H
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1995, 34 (2B): : 1143 - 1148
  • [39] Excitation power dependent photoluminescence characterization of insulator-semiconductor interfaces on near surface quantum structures passivated by silicon interface control layer technology
    Hasegawa, Hideki
    Kodama, Satoshi
    Ikeya, Kengo
    Fujikura, Hajime
    Applied Surface Science, 1997, 117-118 : 710 - 713
  • [40] Excitation power dependent photoluminescence characterization of insulator-semiconductor interfaces on near surface quantum structures passivated by silicon interface control layer technology
    Hasegawa, H
    Kodama, S
    Ikeya, K
    Fujikura, H
    APPLIED SURFACE SCIENCE, 1997, 117 : 710 - 713