Relationship between the photocatalytic characteristics and the oxygen partial pressure of TiO2 thin films prepared by a DC reactive sputtering method

被引：0
|
作者：
机构：
[1] [1,Noguchi, Daisuke
[2] Kawamata, Yoshio
[3] Nagatomo, Takao
来源：
Noguchi, D. (daisuke.noguchi@shibaura.co.jp) | 1600年 / Japan Society of Applied Physics卷 / 43期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 50 条
  • [21] TiO2 films prepared by DC reactive magnetron sputtering at room temperature: Phase control and photocatalytic properties
    Zheng, Jianyun
    Bao, Shanhu
    Guo, Yu
    Jin, Ping
    SURFACE & COATINGS TECHNOLOGY, 2014, 240 : 293 - 300
  • [22] Photocatalytic activity of TiO2:TiN nanocomposite films prepared by DC reactive sputtering technique for air purification
    Kadhim, Firas J.
    Hammadi, Oday A.
    Ali, Mays K.
    PHYSICA SCRIPTA, 2024, 99 (09)
  • [23] The effect of O2 partial pressure on the structure and photocatalytic property of TiO2 films prepared by sputtering
    Liu, BS
    Zhao, XJ
    Zhao, QN
    Li, CL
    He, X
    MATERIALS CHEMISTRY AND PHYSICS, 2005, 90 (01) : 207 - 212
  • [24] Reactive sputtering deposition of photocatalytic TiO2 thin films on glass substrates
    Tavares, C. J.
    Vieira, J.
    Rebouta, L.
    Hungerford, G.
    Coutinho, P.
    Teixeira, V.
    Carneiro, J. O.
    Fernandes, A. J.
    MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 2007, 138 (02): : 139 - 143
  • [25] Cu/TiO2 thin films prepared by reactive RF magnetron sputtering
    Sreedhar, M.
    Reddy, I. Neelakanta
    Bera, Parthasarathi
    Ramachandran, D.
    Saravanan, K. Gobi
    Rabel, Arul Maximus
    Anandan, C.
    Kuppusami, P.
    Brijitta, J.
    APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 2015, 120 (02): : 765 - 773
  • [26] Cu/TiO2 thin films prepared by reactive RF magnetron sputtering
    M. Sreedhar
    I. Neelakanta Reddy
    Parthasarathi Bera
    D. Ramachandran
    K. Gobi Saravanan
    Arul Maximus Rabel
    C. Anandan
    P. Kuppusami
    J. Brijitta
    Applied Physics A, 2015, 120 : 765 - 773
  • [27] Effects of sputtered high-energy particles on the structure and photocatalytic performance of TiO2 films prepared by a DC reactive sputtering method
    Noguchi, D. (daisuke.noguchi@shibaura.co.jp), 1600, Japan Society of Applied Physics (43):
  • [28] Effects of sputtered high-energy particles on the structure and photocatalytic performance of TiO2 films prepared by a DC reactive sputtering method
    Noguchi, D
    Kawamata, Y
    Nagatomo, A
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2004, 43 (7A): : 4351 - 4355
  • [29] Photocatalytic activity studies of TiO2 thin films prepared by r.f. magnetron reactive sputtering
    Zheng, SK
    Xiang, G
    Wang, TM
    Pan, F
    Wang, C
    Hao, WC
    VACUUM, 2003, 72 (01) : 79 - 84
  • [30] Effect of annealing treatment on the photocatalytic activity of TiO2 thin films deposited by dc reactive magnetron sputtering
    Franco Arias, L. M.
    Arias Duran, A.
    Cardona, D.
    Camps, E.
    Gomez, M. E.
    Zambrano, G.
    WORKSHOP ON OXIDE MATERIALS 2014: NOVEL MULTIFUNCTIONAL PROPERTIES, 2015, 614
12345