Relationship between the photocatalytic characteristics and the oxygen partial pressure of TiO2 thin films prepared by a DC reactive sputtering method

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[1] [1,Noguchi, Daisuke
[2] Kawamata, Yoshio
[3] Nagatomo, Takao
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Noguchi, D. (daisuke.noguchi@shibaura.co.jp) | 1600年 / Japan Society of Applied Physics卷 / 43期
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