Solid phase epitaxy for low pressure chemical vapor deposition Si films induced by ion implantation

被引：0
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作者：
Chen, Peng-Shiu [1 ]
Hsieh, T.E. [1 ]
Chu, Chih-Hsun [2 ]
机构：
[1] Dept. of Mat. Sci. and Engineering, National Chiao Tung University, Hsinchu, Taiwan
[2] United Silicon Inc., Hisnchu Sci.-based Industrial Park, Hsinchu, Taiwan
来源：
Thin Solid Films | 1999年 / 353卷 / 01期
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页码：274 / 282
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