Recent advances in vacuum arc ion sources

被引：0
|
作者：
Brown, I.G. [1 ]
Anders, A. [1 ]
Anders, S. [1 ]
Dickinson, M.R. [1 ]
MacGill, R.A. [1 ]
Oks, E.M. [1 ]
机构：
[1] Univ of California, Berkeley, United States
来源：
Surface and Coatings Technology | 1996年 / 84卷 / 1 -3 pt 2期
关键词：
Electrodes - Ion beams - Ion implantation - Metallurgy - Metals - Surface treatment - Vacuum;
D O I：
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中图分类号：
学科分类号：
摘要：
The vacuum arc ion source has found good application for metallurgical surface modification: it provides relatively simple and inexpensive access to high dose metal ion implantation. Several important source developments have been demonstrated recently, including very-broad-beam operation, macroparticle removal, charge state enhancement and the formation of gaseous beams. This paper briefly reviews the operation of vacuum arc ion sources and the typical beam and implantation parameters that can be obtained, and describe these source advances and their bearing on metal ion implantation applications.
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页码：550 / 556
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