XPS studies on interaction of Ti/AlN ceramic

被引：0
|
作者：
Shen, Dianhong [1 ]
Bao, Changlin [1 ]
Lu, Hua [1 ]
Zhang, Xiaojun [1 ]
Lin, Zhangda [1 ]
机构：
[1] Inst of Physics, Academia Sinica, Beijing, China
来源：
Wuli Xuebao/Acta Physica Sinica | 1995年 / 44卷 / 02期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
页码：259 / 265
相关论文
共 50 条
  • [41] Room and high temperature mechanical behavior of Ti-Al-Nb-Mo alloy reinforced with Ti2AlN ceramic particles
    Tan, Yingmei
    Fang, Hongze
    Cui, Hongzhi
    Liu, Yangli
    Chen, Ruirun
    Su, Yanqing
    Guo, Jingjie
    Fu, Hengzhi
    MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING, 2020, 797
  • [42] Interaction of self-assembled monolayers of DNA with electrons:: HREELS and XPS studies
    Vilar, Manuel Rei
    do Rego, Ana M. Botelho
    Ferraria, Ana M.
    Jugnet, Yvette
    Nogues, Claude
    Peled, Dana
    Naaman, Ron
    JOURNAL OF PHYSICAL CHEMISTRY B, 2008, 112 (23): : 6957 - 6964
  • [43] XPS and electrochemical studies on tungsten-oxidizer interaction in chemical mechanical polishing
    Tamboli, D
    Seal, S
    Desai, V
    CHEMICAL-MECHANICAL POLISHING - FUNDAMENTALS AND CHALLENGES, 2000, 566 : 89 - 95
  • [44] XPS AND UPS STUDIES OF GAS-PHASE OXIDATION, ELECTROCHEMISTRY AND CORROSION BEHAVIOR OF TI AND TI5TA
    SIEMENSMEYER, B
    SCHULTZE, JW
    SURFACE AND INTERFACE ANALYSIS, 1990, 16 (1-12) : 309 - 314
  • [45] XPS study of impurities in Si-doped AlN film
    Liang, F.
    Chen, P.
    Zhao, D. G.
    Jiang, D. S.
    Zhao, Z. J.
    Liu, Z. S.
    Zhu, J. J.
    Yang, J.
    Le, L. C.
    Liu, W.
    He, X. G.
    Li, X. J.
    Li, X.
    Liu, S. T.
    Yang, H.
    Liu, J. P.
    Zhang, L. Q.
    Zhang, Y. T.
    Du, G. T.
    SURFACE AND INTERFACE ANALYSIS, 2016, 48 (12) : 1305 - 1309
  • [46] AFM and XPS analysis of the AlN thin film on the Si substrate
    Liu, Wen
    Wang, Zhi-Wu
    Yang, Qing-Dou
    Wei, Jing-Ting
    Yadian Yu Shengguang/Piezoelectrics and Acoustooptics, 2007, 29 (06): : 723 - 725
  • [47] AlN/GaAs界面的AES和XPS研究
    曹昕
    罗晋生
    陈堂胜
    陈克金
    半导体学报, 1999, (07) : 12 - 15
  • [48] The Isothermal Oxidation Behavior of Ti2AlN and Ti2AlN/TiN in Air
    Yan, Ming
    Chen, Yanlin
    Chang, Ying
    Jiang, Jiuxin
    Mei, Bingchu
    EMERGING FOCUS ON ADVANCED MATERIALS, PTS 1 AND 2, 2011, 306-307 : 808 - +
  • [49] Phase Formation in the Synthesis of Ti2AlN by Spark Plasma Sintering in the Ti/AlN System
    Gilev, V. G.
    Kachenyuk, M. N.
    REFRACTORIES AND INDUSTRIAL CERAMICS, 2019, 59 (06) : 658 - 662
  • [50] Phase Formation in the Synthesis of Ti2AlN by Spark Plasma Sintering in the Ti/AlN System
    V. G. Gilev
    M. N. Kachenyuk
    Refractories and Industrial Ceramics, 2019, 59 : 658 - 662
12345