Ion-beam patterning of magnetic films using stencil masks

被引:0
|
作者
Terris, B.D.
Folks, L.
Weller, D.
Baglin, J.E.E.
Kellock, A.J.
Rothuizen, H.
Vettiger, P.
机构
来源
Applied Physics Letters | / 75卷 / 03期
关键词
D O I
暂无
中图分类号
学科分类号
摘要
引用
收藏
相关论文
共 50 条
  • [31] Silicon stencil masks for masked ion beam lithography proximity printing
    Univ of Kassel, Kassel, Germany
    Microelectron Eng, 1-4 (257-260):
  • [32] Analysis, design, and optimization of ion-beam lithography masks
    Tejeda, RO
    Engelstad, RL
    Lovell, EG
    Berry, IL
    EMERGING LITHOGRAPHIC TECHNOLOGIES II, 1998, 3331 : 621 - 628
  • [33] Modeling pattern transfer in ion-beam lithography masks
    Frisque, G
    Tejeda, R
    Engelstad, R
    Lovell, E
    MICROELECTRONIC ENGINEERING, 2000, 53 (1-4) : 623 - 626
  • [34] CONTRAST OF ION-BEAM PROXIMITY PRINTING WITH NONIDEAL MASKS
    STUMBO, DP
    WOLFE, JC
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1994, 12 (06): : 3539 - 3542
  • [35] Patterning of permalloy thin films by means of electron-beam lithography and focused ion-beam milling
    Getlawi, S.
    Koblischka, M. R.
    Hartmann, U.
    Richter, C.
    Sulzbach, T.
    SUPERLATTICES AND MICROSTRUCTURES, 2008, 44 (4-5) : 699 - 704
  • [36] Patterning and reactive ion etching of diamond films using light coupling masks
    Leech, PW
    Reeves, GK
    Holland, AS
    NANOENGINEERED ASSEMBLIES AND ADVANCED MICRO/NANOSYSTEMS, 2004, 820 : 325 - 330
  • [37] Lock in of magnetic stripe domains to pinning lattices produced by focused ion-beam patterning
    Konings, S
    Miguel, J
    Luigjes, J
    Schlatter, H
    Luigjes, H
    Goedkoop, J
    Gadgil, V
    JOURNAL OF APPLIED PHYSICS, 2005, 98 (05)
  • [38] Focused ion-beam patterning of nanoscale ferroelectric capacitors
    Stanishevsky, A
    Aggarwal, S
    Prakash, AS
    Melngailis, J
    Ramesh, R
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1998, 16 (06): : 3899 - 3902
  • [39] Effects of polycrystallinity in nano patterning by ion-beam sputtering
    Yoon, Sun Mi
    Kim, J. -S.
    Yoon, D.
    Cheong, H.
    Kim, Y.
    Lee, H. H.
    JOURNAL OF APPLIED PHYSICS, 2014, 116 (02)
  • [40] Ion-beam nano-patterning by using porous anodic alumina as a mask
    Shin, SW
    Lee, SG
    Lee, J
    Whang, CN
    Lee, JH
    Choi, IH
    Kim, TG
    Song, JH
    NANOTECHNOLOGY, 2005, 16 (08) : 1392 - 1395