Amorphous carbon fibrilliform nanomaterials prepared by chemical vapor deposition

被引:0
|
作者
Takikawa, Hirofumi [3 ]
Yatsuki, Miki [3 ]
Miyano, Ryuichi [3 ]
Nagayama, Makoto [3 ]
Sakakibara, Tateki [3 ]
Itoh, Shigeo [1 ]
Ando, Yoshinori [2 ]
机构
[1] Product Development Center, Futaba Corporation, Chousei, Chiba 299-4395, Japan
[2] Department of Physics, Meijo University, Nagoya 468-8502, Japan
[3] Dept. of Elec. and Electron. Eng., Toyohashi Univerity of Technology, Toyohashi, Aichi 441-8580, Japan
来源
| 1600年 / JJAP, Tokyo卷 / 39期
关键词
Carbon - Catalysts - Chemical vapor deposition - Crystal orientation - Ethylene - Silicon - Substrates - Synthesis (chemical);
D O I
暂无
中图分类号
学科分类号
摘要
Carbon nanomaterials were prepared by chemical vapor deposition (CVD) and hot-filament CVD (HF-CVD) methods. The substrates were silicon 〈100〉 and copper plates on which catalytic metal or metal-oxide thin films were coated by means of the cathodic arc deposition technique. Ethylene gas was used as a precursor. HF-CVD with a filament temperature of 1,000 °C yielded a larger amount of carbon deposit at a lower furnace temperature of 600 °C. High-resolution microscopic observation revealed a variety of amorphous carbon nanomaterials, such as frost columns, coral beads, microcoils, nanocoils, and amorphous nanotubes.
引用
收藏
相关论文
共 50 条
  • [21] Polycyclic Molecule Chemical Vapor Deposition of Amorphous Monolayer Carbon
    Li, Zhenjiang
    Tian, Huifeng
    Sasaki, U.
    Huang, Xudan
    Cheng, Mouyang
    Han, Xiaocang
    Ma, Yinghang
    Liao, Peichi
    Yao, Zhixin
    Wang, Yihan
    Zhang, Lina Yang
    Yin, Ge
    Luo, Yijie
    Li, Wenxi
    Zhang, Xuanyu
    Guo, Junjie
    Zhao, Xiaoxu
    Wang, Lifen
    Chen, Ji
    Liu, Lei
    ADVANCED FUNCTIONAL MATERIALS, 2025,
  • [22] Nitrogenated Amorphous Carbon Film by Thermal Chemical Vapor Deposition
    Mohamad, F.
    Rusop, M.
    2013 IEEE REGIONAL SYMPOSIUM ON MICRO AND NANOELECTRONICS (RSM 2013), 2013, : 235 - 238
  • [23] Carbon nanomaterials synthesis by chemical vapor deposition from conifer exudate
    Luis Ignacio-De La Cruz, Juan
    Judith Gutierrez-Garcia, Carmen
    Ricardo Poire-De La Cruz, David
    Remedios Cisneros-Magana, Maria
    Hernandez-Cristobal, Orlando
    Manuel Sanchez-Yanez, Juan
    Flores-Ramirez, Nelly
    Domratcheva-Lvova, Lada
    MRS ADVANCES, 2022, 7 (30) : 668 - 673
  • [24] Rhenium coating prepared on carbon substrate by chemical vapor deposition
    Tong, Yonggang
    Bai, Shuxin
    Zhang, Hong
    Ye, Yicong
    APPLIED SURFACE SCIENCE, 2012, 261 : 390 - 395
  • [25] Influence of deposition pressure on hydrogenated amorphous carbon films prepared by d.c.-pulse plasma chemical vapor deposition
    Wang, Chengbing
    Shi, Jing
    Xia, Rongbin
    Geng, Zhongrong
    SURFACE AND INTERFACE ANALYSIS, 2013, 45 (04) : 800 - 804
  • [26] The effect of ammonia/acetylene ratio on characteristics of amorphous carbon films prepared by plasma enhanced chemical vapor deposition
    Hsueh, Hsiang-Chun
    Wang, Yan-Kai
    Lee, Sanboh
    SURFACE & COATINGS TECHNOLOGY, 2013, 231 : 353 - 356
  • [27] ON THE MICROSTRUCTURES, OPTICAL AND THERMAL PROPERTIES OF HYDROGENATED AMORPHOUS CARBON FILMS PREPARED BY PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION
    L H Chou and H W Wang Department of Materials Science and Engineering National Tsing Hua University Hsinchu Taiwan China
    真空科学与技术, 1992, (Z1) : 79 - 82
  • [28] Plasma treatment effects on hydrogenated amorphous carbon films prepared by plasma-enhanced chemical vapor deposition
    Wu, Jun
    Wang, Ying-Lang
    Kuo, Cheng-Tzu
    JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS, 2008, 69 (2-3) : 505 - 508
  • [29] On the microstructural, optical, and thermal properties of hydrogenated amorphous carbon films prepared by plasma enhanced chemical vapor deposition
    Chou, L.H.
    Wang, H.W.
    Journal of Applied Physics, 1993, 74 (07): : 4673 - 4680
  • [30] PROPERTIES OF HYDROGENATED AMORPHOUS-SILICON PREPARED BY CHEMICAL VAPOR-DEPOSITION
    ELLIS, FB
    GORDON, RG
    PAUL, W
    YACOBI, BG
    JOURNAL OF NON-CRYSTALLINE SOLIDS, 1983, 59-6 (DEC) : 719 - 722