Amorphous carbon fibrilliform nanomaterials prepared by chemical vapor deposition

被引:0
|
作者
Takikawa, Hirofumi [3 ]
Yatsuki, Miki [3 ]
Miyano, Ryuichi [3 ]
Nagayama, Makoto [3 ]
Sakakibara, Tateki [3 ]
Itoh, Shigeo [1 ]
Ando, Yoshinori [2 ]
机构
[1] Product Development Center, Futaba Corporation, Chousei, Chiba 299-4395, Japan
[2] Department of Physics, Meijo University, Nagoya 468-8502, Japan
[3] Dept. of Elec. and Electron. Eng., Toyohashi Univerity of Technology, Toyohashi, Aichi 441-8580, Japan
来源
| 1600年 / JJAP, Tokyo卷 / 39期
关键词
Carbon - Catalysts - Chemical vapor deposition - Crystal orientation - Ethylene - Silicon - Substrates - Synthesis (chemical);
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摘要
Carbon nanomaterials were prepared by chemical vapor deposition (CVD) and hot-filament CVD (HF-CVD) methods. The substrates were silicon 〈100〉 and copper plates on which catalytic metal or metal-oxide thin films were coated by means of the cathodic arc deposition technique. Ethylene gas was used as a precursor. HF-CVD with a filament temperature of 1,000 °C yielded a larger amount of carbon deposit at a lower furnace temperature of 600 °C. High-resolution microscopic observation revealed a variety of amorphous carbon nanomaterials, such as frost columns, coral beads, microcoils, nanocoils, and amorphous nanotubes.
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