Monolayer epitaxy of GaAs at 650°C by metal-organic chemical-vapor deposition with surface photoabsorption monitoring

被引:0
|
作者
Kim, Y.D.
Nakamura, F.
Yoon, E.
Forbes, D.V.
Coleman, J.J.
机构
来源
Applied Physics Letters | 1996年 / 69卷 / 27期
关键词
D O I
暂无
中图分类号
学科分类号
摘要
引用
收藏
相关论文
共 50 条
  • [31] Heteroepitaxy of Dirac semimetal Cd3As2 by metal-organic chemical-vapor deposition
    Tait, C. R.
    Lee, S. R.
    Deitz, J., I
    Rodriguez, M. A.
    Alliman, D. L.
    Gunning, B. P.
    Peake, G. M.
    Sandoval, A.
    Valdez, N. R.
    Sharps, P. R.
    JOURNAL OF CRYSTAL GROWTH, 2021, 572
  • [32] GaN and AlGaN high-voltage rectifiers grown by metal-organic chemical-vapor deposition
    Ting Gang Zhu
    Uttiya Chowdhury
    Michael M. Wong
    Jonathan C. Denyszyn
    Russell D. Dupuis
    Journal of Electronic Materials, 2002, 31 : 406 - 410
  • [33] Metal-organic chemical-vapor deposition grows cubic-phase gallium nitride LED
    不详
    LASER FOCUS WORLD, 1999, 35 (06): : 9 - +
  • [34] THE VOLATILE PIVALATES OF Y,BA AND CU AS PROSPECTIVE PRECURSORS FOR METAL-ORGANIC CHEMICAL-VAPOR DEPOSITION
    ILJINA, E
    KORJEVA, A
    KUZMINA, N
    TROYANOV, S
    DUNAEVA, K
    MARTYNENKO, L
    MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 1993, 18 (03): : 234 - 236
  • [35] GaN and AlGaN high-voltage rectifiers grown by metal-organic chemical-vapor deposition
    Zhu, TG
    Chowdhury, U
    Wong, MM
    Denyszyn, JC
    Dupuis, RD
    JOURNAL OF ELECTRONIC MATERIALS, 2002, 31 (05) : 406 - 410
  • [36] ADVANCES AND TRENDS IN METAL-ORGANIC CHEMICAL VAPOR EPITAXY
    KUECH, TF
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1991, 202 : 64 - COLL
  • [37] Metal-organic chemical vapor deposition of ZnO
    Pan, M
    Fenwick, WE
    Strassburg, M
    Li, N
    Kang, H
    Kane, MH
    Asghar, A
    Gupta, S
    Varatharajan, R
    Nause, J
    El-Zein, N
    Fabiano, P
    Steiner, T
    Ferguson, I
    JOURNAL OF CRYSTAL GROWTH, 2006, 287 (02) : 688 - 693
  • [38] Metal-organic precursors and chemical vapor deposition
    Valade, L
    Teyssandier, F
    ACTUALITE CHIMIQUE, 1999, (02): : 14 - 21
  • [39] MONITORING CHEMICAL-REACTIONS IN METAL-ORGANIC CHEMICAL VAPOR-DEPOSITION (MOCVD)
    WILLIAMS, JO
    HOARE, R
    HUNT, N
    PARROTT, MJ
    MECHANISMS OF REACTIONS OF ORGANOMETALLIC COMPOUNDS WITH SURFACES, 1989, 198 : 131 - 143
  • [40] Clustering effect and residual stress in InxGa1-xAs/GaAs strained layer grown by metal-organic chemical-vapor deposition
    Hwang, I.
    Lee, C.
    Kim, J.-E.
    Hae Yong Park
    Pigment and Resin Technology, 24 (12):