Excimer laser projection lithography: optical considerations

被引：0
|
作者：
Ehrlich, D.J. [1 ]
Rothschild, M. [1 ]
机构：
[1] Massachusetts Inst of Technology, United States
来源：
Microelectronic Engineering | 1989年 / 9卷 / 1-4期
关键词：
Lasers; Excimer;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
页码：27 / 29
相关论文
共 50 条
  • [31] QUARTER MICRON KRF EXCIMER LASER LITHOGRAPHY
    SASAGO, M
    ENDO, M
    TANI, Y
    KOBAYASHI, S
    KOIZUMI, T
    MATSUO, T
    YAMASHITA, K
    NOMURA, N
    IEICE TRANSACTIONS ON ELECTRONICS, 1993, E76C (04) : 582 - 587
  • [32] Excimer laser for 157nm lithography
    Stamm, U
    Bragin, I
    Govorkov, S
    Kleinschmidt, J
    Pätzel, R
    Slobodtchikov, E
    Vogler, K
    Voss, F
    Basting, D
    EMERGING LITHOGRAPHIC TECHNOLOGIES III, PTS 1 AND 2, 1999, 3676 : 816 - 826
  • [33] Lithography Technology Using a KrF Excimer Laser
    Yamaguchi, A.
    Nakao, S.
    Wakamiya, W.
    Mitsubishi Denki Giho, 71 (03):
  • [34] EXCIMER LASER STEPPER FOR SUBHALF MICRON LITHOGRAPHY
    TANIMOTO, A
    MIYAJI, A
    ICHIHARA, Y
    UEMURA, T
    TANAKA, I
    OPTICAL/LASER MICROLITHOGRAPHY II, 1989, 1088 : 434 - 440
  • [35] Prospects and challenges of ArF excimer laser lithography
    Yokohama Research Cent./Assoc. of, Super-Advanced Electronics, Technologies
    Proc SPIE Int Soc Opt Eng, 1600, (190-192):
  • [36] A survey of advanced excimer optical imaging and lithography
    Matsumoto, K
    Suwa, K
    CHARACTERIZATION AND METROLOGY FOR ULSI TECHNOLOGY, 1998, 449 : 484 - 489
  • [37] EXCIMER LASERS USED IN OPTICAL LITHOGRAPHY EQUIPMENT
    不详
    LASER FOCUS-ELECTRO-OPTICS, 1986, 22 (01): : 20 - 20
  • [38] Laser damage in 1:1 broadband excimer laser lithography
    Haixing Zou
    Chinese Journal of Lasers, 1992, (06)
  • [39] THE ANALYTICAL EVALUATION OF PROJECTION OPTICAL LITHOGRAPHY
    SHIBUYA, M
    TSURUTA, T
    OPTICAL REVIEW, 1995, 2 (02) : 148 - 153
  • [40] EXPANDING THE HORIZONS OF OPTICAL PROJECTION LITHOGRAPHY
    BUCKLEY, JD
    SOLID STATE TECHNOLOGY, 1982, 25 (05) : 77 - 82
12345