PHOTOINDUCED ABSORPTION ON PHOSPHORUS AND NITROGEN DOPED A-Si:H FILMS PREPARED AT HIGH DEPOSITION-RATE.

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作者：
Ueda, Masato [1 ]
Imura, Takeshi [1 ]
Osaka, Yukio [1 ]
机构：
[1] Hiroshima Univ, Higashi Hiroshima, Jpn, Hiroshima Univ, Higashi Hiroshima, Jpn
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes | 1987年 / 26卷 / 05期
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页码：655 / 659
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