共 12 条
- [11] Ion beam analysis of the concentration and thermal release of hydrogen in silicon nitride films prepared by ECR Plasma CVD method Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 1988, 27 (08): : 1406 - 1410
- [12] Thermal stability and hydrogen atom induced etching of nanometer-thick a-Si:H films grown by ion-beam deposition on Si(100) surfaces JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2003, 21 (04): : 831 - 837