Ta2O5 thin films with exceptionally high dielectric constant

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Adv. Process Integration Department, Technology Development Division, Semiconductor Group, C832, 4-1-1, Kamikodanaka, Nakahara-Ku, Kawasaki, 211-88, Japan [1 ]
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Appl Phys Lett | / 16卷 / 2370-2372期
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