193nm material extension

被引：0
|
作者：
Stein, Alan [1 ]
机构：
[1] Rohm and Haas
来源：
European Semiconductor | 2004年 / 26卷 / 02期
关键词：
Critical dimension control - Etch resistance - Exposure equipment - Photoresist material - Post exposure bake;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
(Edited Abstract)
引用
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页码：13 / 14
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