Erratum: `early nitriding stage of evaporated-Ti thin films by N-ion implantation' [J. Vac. Sci. Technol. A 15, 1848 (1997)]

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J Vac Sci Technol A | / 1卷 / 207期

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[1] Early nitriding stage of evaporated-Ti thin films by N-ion implantation (vol 15, pg 1848, 1997)
Kasukabe, Y
Takeda, S
Fujino, Y
Yamada, Y
Nagata, S
Kishimoto, M
Yamaguchi, S
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1998, 16 (01): : 207 - 207
[2] Early nitriding stage of evaporated-Ti thin films by N-ion implantation
J Vac Sci Technol A, 4 (1848):
[3] Early nitriding stage of evaporated-Ti thin films by N-ion implantation
Kasukabe, Y
Takeda, S
Fiujno, Y
Yamada, Y
Nagata, S
Kishimoto, M
Yamaguchi, S
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 1997, 15 (04): : 1848 - 1852
[4] Erratum: 'wavelength tunable fiber Bragg grating devices based on sputter deposited resistive and piezoelectric coatings' [J. Vac. Sci. Technol. A 15, 1791 (1997)]
J Vac Sci Technol A, 5 (2823):
[5] Erratum: 'isolation of a lattice-mismatched AllnAs/GaInAs layer of InP using ion implantation for high energy mobility transistor realization' [J. Vac. Sci. Technol. B 15, 1008 (1997)]
J Vac Sci Technol B, 1 (255):
[6] Erratum: papers from the tenth international vacuum microelectronics conference [J. Vac. Sci. Technol. B 14, 675 (1998)]
Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena, 1998, 16 (05):
[7] Erratum: 'anisotropy in the lateral momentum of CO chemisorbed on Cu(110) studied by time-of-flight electron simulated desorption ion angular distribution' [J. Vac. Sci. Technol. A 15, 1548 (1997)]
Ahner, Joachim
Mocuta, Dan
Ramsier, R.D.
Yates, John T. Jr.
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 1997, 15 (05):
[8] Erratum: 'determination of metal vapor ion concentration in an argon/copper plasma for ionized physical vapor deposition' [J. Vac. Sci. Technol. A 16, 2198 (1998)]
Foster, J.E.
Wendt, A.E.
Wang, W.W.
Booske, J.H.
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 1999, 17 (01):
[9] Erratum: deep-etch silicon mm-waveguide structure for the relativistic acceleration of electrons [J. Vac. Sci. Technol. B 14, 2524 (1996)]
Willke, T.L.
Feinerman, A.D.
Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena, 1996, 14 (06):
[10] Comment on "Nanoscale fatigue and fracture toughness measurement of multilayered thin film structures for digital micromirror devices 99 [J. Vac. Sci. Technol. A 22, 1397 (2004)]
Malzbender, Juergen
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2006, 24 (04): : 1147 - 1147

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