Low k1 lithography redefines photomasks

被引：0
|
作者：
Anon
机构：
来源：
European Semiconductor | 1999年 / 21卷 / 05期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 50 条
  • [21] Inverse lithography technology at low k1: Placement and accuracy of assist features
    Moore, Andrew
    Lin, Timothy
    Liu, Yong
    Russell, Gordon
    Pang, Linyong
    Abrams, Daniel
    PHOTOMASK TECHNOLOGY 2006, PTS 1 AND 2, 2006, 6349
  • [22] Double patterning lithography:: The bridge between low k1 ArF and EUV
    Finders, Jo
    Dusa, Mircea
    Hsu, Stephen
    MICROLITHOGRAPHY WORLD, 2008, 17 (01): : 2 - +
  • [23] Source optimization and mask design to minimize MEEF in low k1 lithography
    Xiao, Guangming
    Cecil, Tom
    Pang, Lingyong
    Gleason, Bob
    McCarty, John
    PHOTOMASK AND NEXT-GENERATION LITHOGRAPHY MASK TECHNOLOGY XV, PTS 1 AND 2, 2008, 7028
  • [24] Manufacturing at k1=0.2 with chromeless phase lithography
    Chen, JF
    Van den Broeke, D
    Laidig, T
    Wampler, KE
    SOLID STATE TECHNOLOGY, 2002, 45 (06) : 67 - +
  • [25] Simulation of image quality issues at low k1 for 100nm lithography
    Neureuther, A
    Adam, K
    Hotta, S
    Pistor, T
    Robbins, G
    Deng, YF
    PHOTOMASK AND NEXT-GENERATION LITHOGRAPHY MASK TECHNOLOGY VIII, 2001, 4409 : 33 - 40
  • [26] Effect of lens aberrations on OPC model accuracy for low k1 lithography process
    Ahn, Jun-Kyu
    Jeong, Chang-Young
    Park, Jeong-Lyeol
    Choi, Jae-Sung
    Lee, Jeong-Gun
    OPTICAL MICROLITHOGRAPHY XIX, PTS 1-3, 2006, 6154 : U2025 - U2034
  • [27] Design and fabrication of customized illumination patterns for low k1 lithography: a diffractive approach
    Himel, MD
    Hutchins, RE
    Colvin, JC
    Poutous, MK
    Kathman, AD
    Fedor, AS
    OPTICAL MICROLITHOGRAPHY XIV, PTS 1 AND 2, 2001, 4346 : 1436 - 1442
  • [28] Extension of practical k1 limit in EUV lithography
    Park, Sarohan
    Lee, Inwhan
    Koo, Sunyoung
    Lee, Junghyung
    Lim, Chang-Moon
    EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY VII, 2016, 9776
  • [29] Extension of low k1 lithography processes with KrF for 90nm technology node
    Jun, Sungho
    Jeong, Eunsoo
    Yun, Youngje
    Choi, Kwangseon
    Kim, Jeahee
    Han, Jaewon
    OPTICAL MICROLITHOGRAPHY XXI, PTS 1-3, 2008, 6924
  • [30] Photomasks for EUV Lithography
    Progler, Christopher
    Abboud, Frank
    JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS, 2013, 12 (02):
12345