Nitridation of TiSi2 thin films by rapid thermal processing

被引：0
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作者：
Perez-Rigueiro, J. [1 ]
Jimenez, C. [1 ]
Vazquez, L. [1 ]
Perez-Casero, R. [1 ]
Martinez-Duart, J.M. [1 ]
机构：
[1] Universidad Autonoma de Madrid, Madrid, Spain
来源：
Surface and Coatings Technology | 1996年 / 80卷 / 1-2期
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页码：72 / 75
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