Ion-assisted etching of boron nitride in radio frequency capacitive discharges

被引：0
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作者：
Rossi, F. [1 ]
Thomas, L. [1 ]
Schaffnit, C. [1 ]
机构：
[1] European Commission, Ispra, Italy
来源：
Surface and Coatings Technology | 1998年 / 100-101卷 / 1-3期
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页码：49 / 54
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