Fabrication of low line edge roughness mold for photo-nanoimprint

被引：0
|
作者：
机构：
[1] [1,Kurashima, Yuichi
[2] Hiroshima, Hiroshi
[3] Komuro, Masanori
[4] Kim, Sang Hoon
[5] Yamazaki, Naoto
[6] Taniguchi, Jun
[7] Miyamoto, Iwao
[8] Namatsu, Hideo
[9] Matsui, Shinji
来源：
Kurashima, Y. (y-kurashima@aist.go.jp) | 1600年 / Japan Society of Applied Physics卷 / 43期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 50 条
  • [21] Fabrication of nanoimprint mold by multilayer film deposition technique
    Zhang, YJ
    Li, W
    Meng, XD
    Yang, JH
    Hua, Z
    Li, W
    Xu, J
    Huang, XF
    Chen, KJ
    ACTA PHYSICA SINICA, 2006, 55 (04) : 2033 - 2037
  • [22] Fabrication of the nanoimprint mold with deep-subwavelength structures
    Liu Quan
    Wu Jianhong
    Zhou Yang
    8TH INTERNATIONAL SYMPOSIUM ON ADVANCED OPTICAL MANUFACTURING AND TESTING TECHNOLOGIES: DESIGN, MANUFACTURING, AND TESTING OF MICRO- AND NANO-OPTICAL DEVICES AND SYSTEMS; AND SMART STRUCTURES AND MATERIALS, 2016, 9685
  • [23] Fabrication of a microlens array electroformed mold with low roughness and high hardness
    Lin, Tsung-Hung
    Hung, Shih-Yu
    Yang, Hsiharng
    Chao, Ching-Kong
    JOURNAL OF MICROMECHANICS AND MICROENGINEERING, 2007, 17 (03) : 419 - 425
  • [24] Novel nano-fabrication technique with low edge roughness
    Hashioka, S
    Mogi, T
    Matsumura, H
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2003, 42 (6B): : 4169 - 4172
  • [25] Line edge roughness (LER) reduction strategy for SOI waveguides fabrication
    Sardo, Stefano
    Giacometti, Fabrizio
    Doneda, Sergio
    Colombo, Umberto
    Di Muri, Melissa
    Donghi, Anna
    Morson, Romano
    Mutinati, Giorgio
    Nottola, Alessandro
    Gentili, Massimo
    Ubaldi, Maria Chiara
    MICROELECTRONIC ENGINEERING, 2008, 85 (5-6) : 1210 - 1213
  • [26] Effects of mold shape and sidewall roughness on nanoimprint by molecular dynamics simulation
    Yao, Chung Han
    Chang, Chih Hang
    Hsieh, Chih Wei
    Sung, Cheng Kuo
    MICROELECTRONIC ENGINEERING, 2010, 87 (5-8) : 864 - 868
  • [27] Fabrication of Large-Area CoNi Mold for Nanoimprint Lithography
    Lee, Jung-Ki
    Cho, Si-Hyeong
    Rizwan, Muhammad
    Yoo, Bong-Young
    Park, Jin-Goo
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2012, 51 (02)
  • [28] Newly developed electron beam stepper for nanoimprint mold fabrication
    Okada, Makoto
    Kishiro, Takashi
    Yanagihara, Kaori
    Ataka, Masashi
    Anazawa, Norimichi
    Matsui, Shinji
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2010, 28 (04): : 740 - 743
  • [29] Mold Design and Fabrication for Surface Relief Gratings by Glass Nanoimprint
    Mori, Toshiharu
    Kimoto, Yoshihisa
    Kasa, Haruya
    Kintaka, Kenji
    Hotou, Norihito
    Nishii, Junji
    Hirai, Yoshihiko
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2009, 48 (06) : 06FH201 - 06FH204
  • [30] Fabrication of Periodic Metal Nanowires with Microscale Mold by Nanoimprint Lithography
    Shi, Shoulei
    Lu, Nan
    Lu, Yongchun
    Wang, Yandong
    Qi, Dianpeng
    Xu, Hongbo
    Chi, Lifeng
    ACS APPLIED MATERIALS & INTERFACES, 2011, 3 (11) : 4174 - 4179
12345