Fabrication of low line edge roughness mold for photo-nanoimprint

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[1] [1,Kurashima, Yuichi
[2] Hiroshima, Hiroshi
[3] Komuro, Masanori
[4] Kim, Sang Hoon
[5] Yamazaki, Naoto
[6] Taniguchi, Jun
[7] Miyamoto, Iwao
[8] Namatsu, Hideo
[9] Matsui, Shinji
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Kurashima, Y. (y-kurashima@aist.go.jp) | 1600年 / Japan Society of Applied Physics卷 / 43期
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