Lateral-size control of trench-buried quantum wires using GaAs/AlAs superlattice layers

被引:0
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作者
Sogawa, Tetsuomi [1 ]
Ando, Seigo [1 ]
Kanbe, Hiroshi [1 ]
机构
[1] NTT Basic Research Lab, Kanagawa, Japan
来源
Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes & Review Papers | 1995年 / 34卷 / 8 B期
关键词
Electron beam lithography - Etching - Metallorganic chemical vapor deposition - Optical properties - Optical variables control - Photoluminescence - Scanning electron microscopy - Semiconducting aluminum compounds - Semiconducting gallium arsenide - Semiconductor device manufacture - Semiconductor superlattices - Substrates;
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摘要
We demonstrated the lateral-size control of GaAs/AlAs trench-buried quantum wires (QWRs) in the region below 20 nm by using GaAs/AlAs superlattice layers (SLs). Scanning electron microscopy images and photoluminescence properties of the trench-buried QWRs revealed that the trench width can be controlled by varying the number of SLs and reduced to about 13 nm by growing 7 pairs of SLs. The GaAs wires in the trenches have a tendency to grow so as to maintain a constant cross-sectional area, which leads to reduction of the energetic broadening of the quantum sub-levels caused by pattern size fluctuation.
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页码:4405 / 4407
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