Smoothing of the Si surface using CF4/O2 down-flow etching

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作者：
Nishino, H.
Hayasaka, N.
Horioka, K.
Shiozawa, J.
Nadahara, S.
Shooda, N.
Akama, Y.
Sakai, A.
Okano, H.
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Journal of Applied Physics | 1993年 / 74卷 / 02期
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