共 50 条
- [31] Multifold study of volume plasma chemistry in Ar/CF4 and Ar/CHF3 CCP discharges PLASMA SOURCES SCIENCE & TECHNOLOGY, 2017, 26 (07):
- [33] Inductively coupled plasma etching of Si1-xGex in CF4/Ar and Cl2/Ar discharges JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2006, 24 (03): : 728 - 731
- [34] CF AND CF2 ACTINOMETRY IN A CF4/AR PLASMA JOURNAL OF APPLIED PHYSICS, 1992, 71 (07) : 3186 - 3192
- [38] Spatial structure of electronegative Ar/CF4 plasmas in capacitive RF discharges Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 2001, 40 (10): : 6115 - 6116
- [39] Probe measurements and global model of inductively coupled Ar/CF4 discharges Plasma Sources Science and Technology, 1999, 8 (04): : 553 - 560
- [40] Spatial structure of electronegative Ar/CF4 plasmas in capacitive RF discharges JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2001, 40 (10): : 6115 - 6116