Monte Carlo simulation of ZnSe/GaAs heterovalent epitaxy

被引:0
|
作者
Sano, Kazuaki [1 ]
Nakayama, Takashi [1 ]
机构
[1] Department of Physics, Faculty of Science, Chiba University, 1-33 Yayoi, Inage, Chiba 263-8522, Japan
关键词
Computer simulation - Defects - Epitaxial growth - Interfaces (materials) - Monte Carlo methods - Zinc compounds;
D O I
暂无
中图分类号
学科分类号
摘要
Heteropitaxy of ZnSe on GaAs As-rich surface is investigated by conventional growth simulation based on the interatomic bonding energy. The model takes into account both the surface-atom dimerization and the electron transfer between surface dangling bonds, Ga-Se donor bonds and Zn-As acceptor bonds. It is shown that, due to the heterovalency between ZnSe and GaAs, antisites and vacant defect structures are produced at the interface and these defects are suppressed when Zn atoms are first supplied on the GaAs surface. These results are in good agreement with experimantal observations.
引用
收藏
页码:4289 / 4291
相关论文
共 50 条
  • [31] Monte Carlo simulation of the kinetic effects on GaAs/GaAs(001) MBE growth
    Ageev, Oleg A.
    Solodovnik, Maxim S.
    Balakirev, Sergey V.
    Mikhaylin, Ilya A.
    Eremenko, Mikhail M.
    JOURNAL OF CRYSTAL GROWTH, 2017, 457 : 46 - 51
  • [32] Electrothermal Monte Carlo Simulation of a GaAs Resonant Tunneling Diode
    Muscato, Orazio
    AXIOMS, 2023, 12 (02)
  • [33] Monte Carlo simulation of As2 adsorption on GaAs surface
    Nastovjak, Alla G.
    Shwartz, Nataliya L.
    Yanovitskaja, Zoya Sh.
    Zverev, Alexey V.
    EDM 2006: 7TH ANNUAL INTERNATIONAL WORKSHOP AND TUTORIALS ON ELECTRON DEVICES AND MATERIALS, PROCEEDINGS, 2006, : 58 - +
  • [34] MONTE-CARLO SIMULATION OF INP AND GAAS-MESFETS
    DUNN, GM
    WALKER, AB
    JEFFERSON, JH
    HERBERT, DC
    SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 1994, 9 (11) : 2123 - 2129
  • [35] Kinetic Monte Carlo simulation of the nitridation of the GaAs (100) surfaces
    Castro, AP
    Alves, HWL
    BRAZILIAN JOURNAL OF PHYSICS, 2006, 36 (2A) : 305 - 308
  • [36] MONTE-CARLO SIMULATION OF THE GAAS PERMEABLE BASE TRANSISTOR
    HWANG, CG
    NAVON, DH
    TANG, TW
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 1987, 34 (02) : 154 - 159
  • [37] Monte Carlo investigation of the influence of V/III flux ratio on GaAs/GaAs(001) submonolayer epitaxy
    O. A. Ageev
    M. S. Solodovnik
    S. V. Balakirev
    I. A. Mikhaylin
    Technical Physics, 2016, 61 : 971 - 977
  • [38] Monte Carlo investigation of the influence of V/III flux ratio on GaAs/GaAs(001) submonolayer epitaxy
    Ageev, O. A.
    Solodovnik, M. S.
    Balakirev, S. V.
    Mikhaylin, I. A.
    TECHNICAL PHYSICS, 2016, 61 (07) : 971 - 977
  • [39] Monte Carlo simulation of MBE growth of GaAs analysis of RHEED
    vanHall, PJ
    Kokten, H
    Leys, MR
    Bosch, M
    STABILITY OF MATERIALS, 1996, 355 : 229 - 234
  • [40] Examination of Catalytic GaAs Nanowire Growth by Monte Carlo Simulation
    Knyazeva, Maria V.
    Shwartz, Nataliya L.
    2014 15TH INTERNATIONAL CONFERENCE OF YOUNG SPECIALISTS ON MICRO/NANOTECHNOLOGIES AND ELECTRON DEVICES (EDM), 2014, : 54 - 56