STUDY OF CONTACT AND SHALLOW JUNCTION CHARACTERISTICS IN SUBMICRON CMOS WITH SELF-ALIGNED TITANIUM SILICIDE.

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作者：
Taur, Y.
Davari, B.
Moy, D.
Sun, J.Y.-C.
Ting, C.Y.
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IBM Journal of Research and Development | 1987年 / 31卷 / 06期
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页码：627 / 633
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