CO2 laser annealing on fluorinated silicon oxide films

被引：0
|
作者：
Wang, Na-Fu [1 ]
Houng, Mau-Phon [1 ]
Wang, Yeong-Her [1 ]
机构：
[1] Department of Electrical Engineering, National Cheng-Kung University, University Road, Tainan, Taiwan
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers | 1999年 / 38卷 / 9 A期
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页码：5227 / 5231
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