Reactive ion-plating for production of nitride and oxide coatings

被引：0

作者：

Buhl, R. ^{[1
]}

Pulker, Hans K. ^{[1
]}

机构：

[1] Balzers AG, Germany

来源：

MO Metalloberflache Beschichten von Metall und Kunststoff | 1988年 / 42卷 / 10期

关键词：

Gases--Ionization - Glow Discharges--Applications - Plasmas--Production - Substrates--Ion Implantation;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

Ion plating is the term used to describe a process for coating substrates under vacuum, which differs from previously known processes in that ions intentionally strike the growing coat and thus give it special properties. These ions can be formed either from coating material atoms or from the argon which is used as the working gas and made to flow through the recipient in order to maintain an ion-generating gas discharge. If reactive gases such as O2 and N2 are present, they are also excited and ionized.

引用

页码：473 / 476

共 50 条

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