Determination of the chemical and physical properties of hydrogenated carbon deposits produced by d.c. magnetron reactive sputtering

被引：0
|
作者：
Brande, Pierre Vanden [1 ]
Lucas, Stephane [1 ]
Winand, Rene [1 ]
Weymeersch, Alain [1 ]
Renard, Lucien [1 ]
机构：
[1] Universite Libre de Bruxelles, Brussels, Belgium
来源：
Surface and Coatings Technology | 1994年 / 68-69卷
关键词：
Carbon autofeeding target system - Direct current magnetron reactive sputtering - Elastic recoil detection analysis - Gas flow ratio - Hydrogen content - Hydrogenated carbon deposits - Mass flow controller - Nanoindentation - Vacuum chamber - Young modulus;
D O I：
10.1016/0257-8972(94)90233-X
中图分类号：
学科分类号：
摘要：
引用
收藏
页码：656 / 661
相关论文
共 50 条
  • [21] Corrosion-resistant and hard 310 stainless steel-carbon coatings prepared by reactive D.C. magnetron sputtering
    Billard, A., 1600, (43): : 1 - 3
  • [22] Metallic Cu and In films deposited by d.c. magnetron sputtering
    J. M. Mwabora
    R. T. Kivaisi
    Journal of Materials Science: Materials in Electronics, 2001, 12 : 75 - 80
  • [23] Comparison of transparent conductive oxide thin films prepared by a.c. and d.c. reactive magnetron sputtering
    Jager, S
    Szyszka, B
    Szczyrbowski, J
    Brauer, G
    SURFACE & COATINGS TECHNOLOGY, 1998, 98 (1-3): : 1304 - 1314
  • [24] The influence of substrate temperature on the electrical and optical properties of titanium oxide thin films prepared by d.c. reactive magnetron sputtering
    Ju, Yongfeng
    Wu, Zhiming
    Qiu, Yonglong
    Li, Lin
    Jiang, Yadong
    5TH INTERNATIONAL SYMPOSIUM ON ADVANCED OPTICAL MANUFACTURING AND TESTING TECHNOLOGIES: OPTOELECTRONIC MATERIALS AND DEVICES FOR DETECTOR, IMAGER, DISPLAY, AND ENERGY CONVERSION TECHNOLOGY, 2010, 7658
  • [25] Preparation and characterization of (Ti, Al, Si)N coatings developed by d.c. reactive magnetron sputtering
    Jakab-Farkas, L.
    Biro, D.
    Strnad, G.
    Vida-Simiti, I.
    JOURNAL OF OPTOELECTRONICS AND ADVANCED MATERIALS, 2013, 15 (7-8): : 696 - 702
  • [26] Preparation and characterization of (Ti, Al, Si)N coatings developed by d.c. reactive magnetron sputtering
    Strnad, G. (gabriela.strnad@ing.upm.ro), 1600, National Institute of Optoelectronics (15): : 7 - 8
  • [27] Dependence of tribological properties on deposition parameters for non hydrogenated amorphous carbon films produced by magnetron sputtering
    Mounier, E
    Juliet, P
    Quesnel, E
    Pauleau, Y
    SURFACE & COATINGS TECHNOLOGY, 1995, 76-77 (1-3): : 548 - 552
  • [28] Physical properties of thin GeO2 films produced by reactive DC magnetron sputtering
    Lange, T
    Njoroge, W
    Weis, H
    Beckers, M
    Wuttig, M
    THIN SOLID FILMS, 2000, 365 (01) : 82 - 89
  • [29] Tribological properties of Mo-S-C coating deposited by pulsed d.c. magnetron sputtering
    Vitu, T.
    Huminiuc, T.
    Doll, G.
    Bousser, E.
    Matthews, A.
    Polcar, T.
    WEAR, 2021, 480
  • [30] Modified TiAlN coatings prepared by d.c. pulsed magnetron sputtering
    Keunecke, M.
    Stein, C.
    Bewilogua, K.
    Koelker, W.
    Kassel, D.
    van den Berg, H.
    SURFACE & COATINGS TECHNOLOGY, 2010, 205 (05): : 1273 - 1278
12345