Damage formed by plasma boron doping in silicon

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[1] Hara, Tohru
[2] Shinada, Kiyotaka
[3] Nakamura, Shigeaki
来源：
Hara, Tohru | 1600年 / JJAP, Minato-ku, Japan卷 / 33期
关键词：
Semiconducting silicon;
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