Improvement of a microwave ion source for surface modification

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[1] Sakudo, N.
[2] Tokiguchi, K.
[3] Seki, T.
[4] Koike, H.
[5] Iwaki, M.
来源：
Sakudo, N. | 1600年 / A116期
关键词：
Beam Profile Monitor - Emittance Measuring Device - Mass Separator - Microwave Ion Source;
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