Evaporation of Ta2O5

被引：0
|
作者：
机构：
来源：
Phys Lett Sect B Nucl Elem Part High Energy Phys | / 16期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 50 条
  • [41] ELECTRICAL-CONDUCTIVITY IN TA2O5
    BALACHANDRAN, U
    EROR, NG
    MATERIALS RESEARCH BULLETIN, 1982, 17 (02) : 151 - 160
  • [42] NONSTOICHIOMETRY AND CHARGE TRANSPORT IN TA2O5
    MCHALE, AE
    TULLER, HL
    AMERICAN CERAMIC SOCIETY BULLETIN, 1981, 60 (03): : 404 - 404
  • [43] FLAWS IN ANODIC TA2O5 FILMS
    VERMILYEA, DA
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1963, 110 (04) : 250 - 262
  • [44] SCINTILLATION IN ANODIC TA2O5 FILMS
    ALBELLA, JM
    MONTERO, I
    MARTINEZDUART, JM
    THIN SOLID FILMS, 1979, 58 (02) : 307 - 311
  • [45] FLAWS IN ANODIC TA2O5 FILMS
    HUBER, K
    VERMILYEA, DA
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1963, 110 (12) : 1286 - 1289
  • [46] Application of Ta2O5 in microelectronics and MOEMS
    Li, YH
    Wilfried, N
    Dong, HF
    de Rooij, NF
    Zhang, WD
    ISTM/2001: 4TH INTERNATIONAL SYMPOSIUM ON TEST AND MEASUREMENT, VOLS 1 AND 2, CONFERENCE PROCEEDINGS, 2001, : 1662 - 1666
  • [47] Nonstoichiometry and mixed conduction in α-Ta2O5
    Choi, Gyeong M., 1700, (73):
  • [48] X-ray photoelectron spectroscopy study of Al/Ta2O5 and Ta2O5/Al buried interfaces
    Chen, K
    Yang, GR
    Nielsen, M
    Lu, TM
    Rymaszewski, EJ
    APPLIED PHYSICS LETTERS, 1997, 70 (03) : 399 - 401
  • [49] Laser Induced Damage Threshold of Ta2O5 and Ta2O5/SiO2 Films at 532 and 1064 nm
    Kumar, Sunil
    Shankar, Ajay
    Kishore, Nawal
    Mukherjee, C.
    Kamparath, Rajiv
    Thakur, Sudhakar
    OPTIK, 2019, 176 : 438 - 447
  • [50] NB2O5 AND TA2O5 CODOPED ZIRCONIA
    GRITZNER, G
    PUCHNER, C
    DUSZA, J
    JOURNAL OF THE EUROPEAN CERAMIC SOCIETY, 1995, 15 (01) : 45 - 49
12345