High-temperature etching of PZT/Pt/TiN structure by high-density ECR plasma

被引：0
|
作者：
Yokoyama, Seiichi [1 ]
Ito, Yasuyuki [1 ]
Ishihara, Kazuya [1 ]
Hamada, Kazuyuki [1 ]
Ohnishi, Shigeo [1 ]
Kudo, Jun [1 ]
Sakiyama, Keizo [1 ]
机构：
[1] Functional Devices Lab, Chiba, Japan
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes & Review Papers | 1995年 / 34卷 / 2 B期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
页码：767 / 770
相关论文
共 50 条
  • [21] POLARIZATION MODEL FOR HIGH-TEMPERATURE AND HIGH-DENSITY WATER DROPLETS
    DEMETROS, G
    DAVID, CW
    JOURNAL OF CHEMICAL PHYSICS, 1982, 77 (12): : 6340 - 6341
  • [22] Probe Lasers for Characterizing High-temperature, High-density Plasmas
    Glenzer, Siegfried
    2013 CONFERENCE ON LASERS AND ELECTRO-OPTICS (CLEO), 2013,
  • [23] HIGH-DENSITY AND HIGH-TEMPERATURE SYMMETRY BEHAVIOR IN GAUGE THEORIES
    LINDE, AD
    PHYSICAL REVIEW D, 1976, 14 (12): : 3345 - 3349
  • [24] Eliminating etch stop in high-density magnetic tunnel junction patterning using high-temperature CO/NH3 plasma etching
    Satake, Makoto
    Abe, Takahiro
    Ichino, Takamasa
    Suyama, Makoto
    Kawaguchi, Tadayoshi
    Yamada, Masaki
    Matsumoto, Eiji
    Maeda, Kenji
    Yokogawa, Kenetsu
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2019, 37 (06):
  • [25] High-density plasma etching of low dielectric constant materials
    Standaert, TEFM
    Matsuo, PJ
    Allen, SD
    Oehrlein, GS
    Dalton, TJ
    Lu, TM
    Gutmann, R
    LOW-DIELECTRIC CONSTANT MATERIALS IV, 1998, 511 : 265 - 275
  • [26] The effect of etching gases on notching and charging in high-density plasma
    Tabara, S
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1998, 37 (6A): : 3570 - 3575
  • [27] Patterned platinum etching studies in an argon high-density plasma
    Delprat, S
    Chaker, M
    Margot, J
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1999, 38 (7B): : 4488 - 4491
  • [28] Study of plasma-surface interactions: Chemical dry etching and high-density plasma etching
    Oehrlein, GS
    Matsuo, PJ
    Doemling, MF
    Rueger, NR
    Kastenmeier, BEE
    Schaepkens, M
    Standaert, T
    Beulens, JJ
    PLASMA SOURCES SCIENCE & TECHNOLOGY, 1996, 5 (02): : 193 - 199
  • [29] Diamond nucleation using a pulsed high-temperature and high-density CH4-plasma beam
    Zhang, HX
    Lin, Z
    Jiang, YB
    Feng, KA
    Yang, SZ
    JOURNAL OF MATERIALS SCIENCE LETTERS, 1998, 17 (18) : 1515 - 1518
  • [30] Relativistic correction of (v/c)2 to the collective Thomson scattering for high-temperature high-density plasma
    Jiang Chen-Fan-Fu
    Zheng Jian
    Zhao Bin
    CHINESE PHYSICS B, 2011, 20 (09)
12345