High-temperature etching of PZT/Pt/TiN structure by high-density ECR plasma

被引：0
|
作者：
Yokoyama, Seiichi [1 ]
Ito, Yasuyuki [1 ]
Ishihara, Kazuya [1 ]
Hamada, Kazuyuki [1 ]
Ohnishi, Shigeo [1 ]
Kudo, Jun [1 ]
Sakiyama, Keizo [1 ]
机构：
[1] Functional Devices Lab, Chiba, Japan
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes & Review Papers | 1995年 / 34卷 / 2 B期
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页码：767 / 770
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