Low-temperature fluorination of GaAs surface by CF4 plasma

被引：0
|
作者：
Iida, Masahiro [1 ]
Kaibe, Hiromasa T. [1 ]
Okumura, Tsugunori [1 ]
机构：
[1] Tokyo Metropolitan Univ, Hachiohji, Japan
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers | 1991年 / 30卷 / 07期
关键词：
13;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
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页码：1581 / 1584
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