Fabrication of metal-oxide-semiconductor devices with extreme ultraviolet lithography

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作者：
Nguyen, K.B.
Cardinale, G.F.
Tichenor, D.A.
Kubiak, G.D.
Berger, K.
Ray-Chaudhuri, A.K.
Perras, Y.
Haney, S.J.
Nissen, R.
Krenz, K.
Stulen, R.H.
Fujioka, H.
Hu, C.
Bokor, J.
Tennant, D.M.
et. al.
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来源：
Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena | 1996年 / 14卷 / 06期
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