Effects of oxygen addition on growth of a diamond film by arc discharge plasma jet chemical vapor deposition

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作者：
Ohtake, Naoto [1 ]
Yoshikawa, Masanori [1 ]
机构：
[1] Tokyo Inst of Technology, Tokyo, Japan
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers | 1993年 / 32卷 / 5 S期
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页码：2067 / 2073
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