共 50 条
- [1] COMPACT ELECTRON-CYCLOTRON RESONANCE PLASMA-ETCHING REACTOR EMPLOYING PERMANENT-MAGNET JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1991, 30 (11B): : 3159 - 3163
- [2] CRYOGENIC ELECTRON-CYCLOTRON RESONANCE PLASMA-ETCHING JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1992, 10 (04): : 1307 - 1312
- [4] Characterization of a permanent magnet electron cyclotron resonance plasma source Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics, 1991, 9 (01): : 26 - 28
- [5] ELECTRON-CYCLOTRON-RESONANCE PLASMA REACTOR FOR CRYOGENIC ETCHING REVIEW OF SCIENTIFIC INSTRUMENTS, 1993, 64 (12): : 3572 - 3584
- [6] Diagnostics of fluorocarbon radicals in a large-area permanent magnet electron cyclotron resonance etching plasma JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 1996, 35 (12B): : 6528 - 6533
- [8] DAMAGE INDUCED BY ELECTRON-CYCLOTRON RESONANCE PLASMA-ETCHING ON SILICON SURFACE JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1991, 30 (05): : 1045 - 1049
- [9] ANISOTROPIC HIGHLY SELECTIVE ELECTRON-CYCLOTRON RESONANCE PLASMA-ETCHING OF POLYSILICON JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1992, 10 (04): : 1303 - 1306
- [10] ELECTRON-CYCLOTRON RESONANCE PLASMA-ETCHING USING DOWNSTREAM MAGNETIC CONFINEMENT JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1992, 10 (06): : 2725 - 2728