Hydroxyl-radical-assisted growth of ZnO films by remote plasma metal-organic chemical vapor deposition

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[1] Nakamura, Atsushi
[2] Shigemori, Satoshi
[3] Shimizu, Yoshimi
[4] Aoki, Toru
[5] 1,Temmyo, Jiro
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Nakamura, A. (atsushi@nvrc.rie.shizuoka.ac.jp) | 1600年 / Japan Society of Applied Physics卷 / 43期
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