首页
学术期刊
论文检测
AIGC检测
热点
更多
数据
Shallow levels in n-type 6H-silicon carbide as determined by admittance spectroscopy
被引:0
|
作者
:
机构
:
来源
:
|
1600年
/ American Inst of Physics, Woodbury, NY, USA卷
/ 75期
关键词
:
D O I
:
暂无
中图分类号
:
学科分类号
:
摘要
:
引用
收藏
相关论文
共 50 条
[31]
Photoluminescence characterization of beryllium-implanted 6H-silicon carbide
Chen, XD
论文数:
0
引用数:
0
h-index:
0
机构:
Univ Hong Kong, Dept Phys, Hong Kong, Hong Kong, Peoples R China
Chen, XD
Fung, S
论文数:
0
引用数:
0
h-index:
0
机构:
Univ Hong Kong, Dept Phys, Hong Kong, Hong Kong, Peoples R China
Univ Hong Kong, Dept Phys, Hong Kong, Hong Kong, Peoples R China
Fung, S
Beling, CD
论文数:
0
引用数:
0
h-index:
0
机构:
Univ Hong Kong, Dept Phys, Hong Kong, Hong Kong, Peoples R China
Beling, CD
Huang, Y
论文数:
0
引用数:
0
h-index:
0
机构:
Univ Hong Kong, Dept Phys, Hong Kong, Hong Kong, Peoples R China
Huang, Y
Li, Q
论文数:
0
引用数:
0
h-index:
0
机构:
Univ Hong Kong, Dept Phys, Hong Kong, Hong Kong, Peoples R China
Li, Q
Xu, SJ
论文数:
0
引用数:
0
h-index:
0
机构:
Univ Hong Kong, Dept Phys, Hong Kong, Hong Kong, Peoples R China
Xu, SJ
Gong, M
论文数:
0
引用数:
0
h-index:
0
机构:
Univ Hong Kong, Dept Phys, Hong Kong, Hong Kong, Peoples R China
Gong, M
Henkel, T
论文数:
0
引用数:
0
h-index:
0
机构:
Univ Hong Kong, Dept Phys, Hong Kong, Hong Kong, Peoples R China
Henkel, T
Tanoue, H
论文数:
0
引用数:
0
h-index:
0
机构:
Univ Hong Kong, Dept Phys, Hong Kong, Hong Kong, Peoples R China
Tanoue, H
Kobayashi, N
论文数:
0
引用数:
0
h-index:
0
机构:
Univ Hong Kong, Dept Phys, Hong Kong, Hong Kong, Peoples R China
Kobayashi, N
SOLID STATE COMMUNICATIONS,
2002,
121
(2-3)
: 67
-
71
[32]
Band gap states of V and Cr in 6H-silicon carbide
N. Achtziger
论文数:
0
引用数:
0
h-index:
0
机构:
Friedrich-Schiller-Universität Jena,
N. Achtziger
J. Grillenberger
论文数:
0
引用数:
0
h-index:
0
机构:
Friedrich-Schiller-Universität Jena,
J. Grillenberger
W. Witthuhn
论文数:
0
引用数:
0
h-index:
0
机构:
Friedrich-Schiller-Universität Jena,
W. Witthuhn
Applied Physics A,
1997,
65
: 329
-
331
[33]
Photoelectrochemical etching of n-type 4H silicon carbide
Shishkin, Y
论文数:
0
引用数:
0
h-index:
0
机构:
Univ Pittsburgh, Dept Phys & Astron, Pittsburgh, PA 15260 USA
Univ Pittsburgh, Dept Phys & Astron, Pittsburgh, PA 15260 USA
Shishkin, Y
Choyke, WJ
论文数:
0
引用数:
0
h-index:
0
机构:
Univ Pittsburgh, Dept Phys & Astron, Pittsburgh, PA 15260 USA
Univ Pittsburgh, Dept Phys & Astron, Pittsburgh, PA 15260 USA
Choyke, WJ
Devaty, RP
论文数:
0
引用数:
0
h-index:
0
机构:
Univ Pittsburgh, Dept Phys & Astron, Pittsburgh, PA 15260 USA
Univ Pittsburgh, Dept Phys & Astron, Pittsburgh, PA 15260 USA
Devaty, RP
JOURNAL OF APPLIED PHYSICS,
2004,
96
(04)
: 2311
-
2322
[34]
Electrical transport in n-type 4H silicon carbide
Pernot, J
论文数:
0
引用数:
0
h-index:
0
机构:
CNRS, UMR 5650, Etud Semicond Grp, F-34095 Montpellier 5, France
Pernot, J
Zawadzki, W
论文数:
0
引用数:
0
h-index:
0
机构:
CNRS, UMR 5650, Etud Semicond Grp, F-34095 Montpellier 5, France
Zawadzki, W
Contreras, S
论文数:
0
引用数:
0
h-index:
0
机构:
CNRS, UMR 5650, Etud Semicond Grp, F-34095 Montpellier 5, France
Contreras, S
Robert, JL
论文数:
0
引用数:
0
h-index:
0
机构:
CNRS, UMR 5650, Etud Semicond Grp, F-34095 Montpellier 5, France
Robert, JL
Neyret, E
论文数:
0
引用数:
0
h-index:
0
机构:
CNRS, UMR 5650, Etud Semicond Grp, F-34095 Montpellier 5, France
Neyret, E
Di Cioccio, L
论文数:
0
引用数:
0
h-index:
0
机构:
CNRS, UMR 5650, Etud Semicond Grp, F-34095 Montpellier 5, France
Di Cioccio, L
JOURNAL OF APPLIED PHYSICS,
2001,
90
(04)
: 1869
-
1878
[35]
Low-dose nitrogen implants in 6H-silicon carbide
Saks, NS
论文数:
0
引用数:
0
h-index:
0
机构:
USN, Res Lab, Washington, DC 20375 USA
Saks, NS
Agarwal, AK
论文数:
0
引用数:
0
h-index:
0
机构:
USN, Res Lab, Washington, DC 20375 USA
Agarwal, AK
Mani, SS
论文数:
0
引用数:
0
h-index:
0
机构:
USN, Res Lab, Washington, DC 20375 USA
Mani, SS
Hegde, VS
论文数:
0
引用数:
0
h-index:
0
机构:
USN, Res Lab, Washington, DC 20375 USA
Hegde, VS
APPLIED PHYSICS LETTERS,
2000,
76
(14)
: 1896
-
1898
[36]
Structural anisotropy effect on the nanoscratching of monocrystalline 6H-silicon carbide
Wu, Zhonghuai
论文数:
0
引用数:
0
h-index:
0
机构:
Univ New South Wales, Sch Mech & Mfg Engn, Lab Precis & Nano Proc Technol, Sydney, NSW 2052, Australia
Univ New South Wales, Sch Mech & Mfg Engn, Lab Precis & Nano Proc Technol, Sydney, NSW 2052, Australia
Wu, Zhonghuai
Zhang, Liangchi
论文数:
0
引用数:
0
h-index:
0
机构:
Southern Univ Sci & Technol, Shenzhen Key Lab Cross Scale Mfg Mech, Shenzhen 518055, Guangdong, Peoples R China
Southern Univ Sci & Technol, Dept Mech & Aerosp Engn, Shenzhen 518055, Guangdong, Peoples R China
Univ New South Wales, Sch Mech & Mfg Engn, Lab Precis & Nano Proc Technol, Sydney, NSW 2052, Australia
Zhang, Liangchi
Liu, Weidong
论文数:
0
引用数:
0
h-index:
0
机构:
Univ New South Wales, Sch Mech & Mfg Engn, Lab Precis & Nano Proc Technol, Sydney, NSW 2052, Australia
Univ New South Wales, Sch Mech & Mfg Engn, Lab Precis & Nano Proc Technol, Sydney, NSW 2052, Australia
Liu, Weidong
WEAR,
2021,
476
(476)
[37]
FORMATION AND CHARACTERIZATION OF COBALT 6H-SILICON CARBIDE SCHOTTKY CONTACTS
LUNDBERG, N
论文数:
0
引用数:
0
h-index:
0
机构:
Royal Institute of Technology, Solid State Electronics, S-164 28 Kista
LUNDBERG, N
OSTLING, M
论文数:
0
引用数:
0
h-index:
0
机构:
Royal Institute of Technology, Solid State Electronics, S-164 28 Kista
OSTLING, M
APPLIED PHYSICS LETTERS,
1993,
63
(22)
: 3069
-
3071
[38]
On the presence of aluminum in thermally grown oxides on 6H-silicon carbide
Sridevan, S
论文数:
0
引用数:
0
h-index:
0
机构:
Power Semicondoctor Research Center, North Carolina State University, Raleigh
Sridevan, S
McLarty, PK
论文数:
0
引用数:
0
h-index:
0
机构:
Power Semicondoctor Research Center, North Carolina State University, Raleigh
McLarty, PK
Baliga, BJ
论文数:
0
引用数:
0
h-index:
0
机构:
Power Semicondoctor Research Center, North Carolina State University, Raleigh
Baliga, BJ
IEEE ELECTRON DEVICE LETTERS,
1996,
17
(03)
: 136
-
138
[39]
THERMAL-OXIDATION OF N-TYPE AND P-TYPE 6H SILICON-CARBIDE
ZETTERLING, CM
论文数:
0
引用数:
0
h-index:
0
机构:
Royal Institute of Technology, Department of Electronin, Solid State Electronics, Kista-Stockholm, S164 40
ZETTERLING, CM
OSTLING, M
论文数:
0
引用数:
0
h-index:
0
机构:
Royal Institute of Technology, Department of Electronin, Solid State Electronics, Kista-Stockholm, S164 40
OSTLING, M
PHYSICA SCRIPTA,
1994,
54
: 291
-
293
[40]
Band gap states of V and Cr in 6H-silicon carbide
Achtziger, N.
论文数:
0
引用数:
0
h-index:
0
机构:
Friedrich-Schiller-Universitaet Jena, Jena, Germany
Friedrich-Schiller-Universitaet Jena, Jena, Germany
Achtziger, N.
Grillenberger, J.
论文数:
0
引用数:
0
h-index:
0
机构:
Friedrich-Schiller-Universitaet Jena, Jena, Germany
Friedrich-Schiller-Universitaet Jena, Jena, Germany
Grillenberger, J.
Witthuhn, W.
论文数:
0
引用数:
0
h-index:
0
机构:
Friedrich-Schiller-Universitaet Jena, Jena, Germany
Friedrich-Schiller-Universitaet Jena, Jena, Germany
Witthuhn, W.
Applied Physics A: Materials Science and Processing,
1997,
A 65
(03):
: 329
-
331
←
1
2
3
4
5
→