Stress development kinetics in plasma-enhanced chemical-vapor-deposited silicon nitride films

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作者：
Hughey, Michael P. [1 ]
Cook, Robert F. [1 ]
机构：
[1] Department of Chemical Engineering and Materials Science, University of Minnesota, Minneapolis, MN 55455, United States
来源：
Journal of Applied Physics | 2005年 / 97卷 / 11期
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摘要：
37
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