STATUS OF IC APPLICATIONS OF ION IMPLANTATION.

被引：0
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作者：
Smith, T.C. [1 ]
机构：
[1] Motorola Semiconductor Group, Mesa,, AZ, USA, Motorola Semiconductor Group, Mesa, AZ, USA
来源：
Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms | 1986年 / B21卷 / 2-4期
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摘要：
After more than a decade of production use in the semiconductor industry, ion implantation is a key process in virtually all device technologies. Some present and future applications are reviewed, along with processing trends and manufacturing concerns. Competing solutions to problems and alternate means to obtain device performance improvements will be discussed. The related trends in equipment development are considered with reference to their potential applications in production.
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页码：90 / 95
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