Novel silicon-containing negative resist for bilayer application in electron beam direct writing

被引：0
|
作者：
Hashimoto, Kazuhiko [1 ]
Endo, Masayuki [1 ]
Sasago, Masaru [1 ]
机构：
[1] Matsushita Electric Industrial Co, Osaka, Japan
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers | 1993年 / 32卷 / 07期
关键词：
Alkaline soluble polymers - Bilayer resist process - Polysilsesquioxane - Silicon containing resists;
D O I：
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中图分类号：
学科分类号：
摘要：
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页码：3317 / 3320
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