Characteristics of xenon capillary Z-pinch extreme ultraviolet lithography source driven by different dI/dt discharge current pulses

被引：0
|
作者：
机构：
[1] Song, Inho
[2] Iwata, Kazuhiro
[3] Homma, Yusuke
[4] Mohanty, Smruti Ranjan
[5] Watanabe, Masato
[6] Kawamura, Toru
[7] Okino, Akitoshi
[8] Yasuoka, Koichi
[9] Horioka, Kazuhiko
[10] Hotta, Eiki
来源：
Song, I. (inno@plasma.es.titech.ac.jp) | 1600年 / Japan Society of Applied Physics卷 / 44期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 38 条
  • [1] Effect of Current Pulse Width on Xenon Z-pinch Discharge Plasma for Extreme Ultraviolet Source
    Lu, Peng
    Watanabe, Tetsuya
    Katsuki, Sunao
    Sakugawa, Takashi
    Akiyama, Hidenori
    PROCEEDINGS OF THE 2012 IEEE INTERNATIONAL POWER MODULATOR AND HIGH VOLTAGE CONFERENCE, 2012, : 140 - 143
  • [2] Radio-frequency-preionized xenon z-pinch source for extreme ultraviolet lithography
    McGeoch, M
    APPLIED OPTICS, 1998, 37 (09): : 1651 - 1658
  • [3] Xenon Z-Pinch Discharge Plasma EUV Source Driven by Ultrashort Current Pulse
    Lu, Peng
    Katsuki, Sunao
    Akiyama, Hidenori
    IEEE TRANSACTIONS ON PLASMA SCIENCE, 2016, 44 (07) : 1228 - 1234
  • [4] Development of capillary Z-pinch discharge light source for EUV lithography
    Song, IH
    Okamoto, M
    Kitade, K
    Masnavi, M
    Hayashi, Y
    Watanabe, M
    Okino, A
    Yasuoka, K
    Horioka, K
    Hotta, E
    LIGHT SOURCES 2004, 2004, (182): : 281 - 282
  • [5] Extreme ultraviolet light emission from Z-pinch discharge plasma source
    Watanabe, M
    Song, I
    Sakamoto, T
    Kobayashi, Y
    Okino, A
    Mohanty, SR
    Horioka, K
    Hotta, E
    DENSE Z-PINCHES, 2006, 808 : 267 - +
  • [6] Power scaling of a Z-pinch extreme ultraviolet source
    McGeoch, MW
    EMERGING LITHOGRAPHIC TECHNOLOGIES IV, 2000, 3997 : 861 - 866
  • [7] Dependence of extreme ultraviolet emission on xenon flow rate from a Z-pinch discharge plasma
    Zhang, Chaohai
    Cheng, Yuanli
    Katsuki, Sunao
    Akiyama, Hidenori
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2008, 47 (06) : 4878 - 4880
  • [8] High power extreme ultraviolet source based on a Z-pinch
    McGeoch, MW
    EMERGING LITHOGRAPHIC TECHNOLOGIES III, PTS 1 AND 2, 1999, 3676 : 697 - 701
  • [9] Dynamic z-pinch as a source of intense extreme ultraviolet radiation
    Mehling, A.
    Boess, T.
    Metzner, J.
    Langhoff, H.
    1600, American Inst of Physics, Woodbury, NY, United States (76):
  • [10] Development of capillary Z-pinch discharge EUV light source
    Watanabe, M
    Kasao, T
    Okamoto, M
    Song, IH
    Okino, A
    Horioka, K
    Hotta, E
    FOURTH INTERNATIONAL SYMPOSIUM ON LASER PRECISION MICROFABRICATION, 2003, 5063 : 278 - 281
1234