Inductively coupled plasma etching of Ta2O5

A number of different plasma chemistries were examined for dry etching of thin film Ta2O5. Maximum etch rates of approximately 1200 angstroms min-1 were achieved with SF6 or Cl2 discharges, while CH4/H2/Ar and N2/Ar produced rates an order of magnitude lower. The etch rates of Ta2O5 were always slower than those for Si under the same conditions in each of the different chemistries, and there was no effect of postdeposition annealing of the Ta2O5 on the resultant dry etch rates.