Surface discharge characteristics of MgO thin films prepared by RF reactive magnetron sputtering

被引：0
|
作者：
Pusan Natl Univ, Pusan, Korea, Republic of [1 ]
机构：
来源：
Surf Coat Technol | / 3卷 / 128-135期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 50 条
  • [1] Surface discharge characteristics of MgO thin films prepared by RF reactive magnetron sputtering
    Park, CH
    Lee, WG
    Kim, DH
    Ha, HJ
    Ryu, JY
    SURFACE & COATINGS TECHNOLOGY, 1998, 110 (03): : 128 - 135
  • [2] Surface-discharge characteristics of MgO-thin films prepared by reactive RF unbalanced magnetron sputtering
    Park, CH
    Kim, YK
    Lee, SH
    Lee, WG
    Sung, YM
    THIN SOLID FILMS, 2000, 366 (1-2) : 88 - 94
  • [3] Surface discharge characteristics of MgO thin films prepared by RF reactive magnetron sputtering (vol 110, pg 128, 1998)
    Park, CH
    Lee, WG
    Kim, DH
    Ha, HJ
    Ryu, JY
    SURFACE & COATINGS TECHNOLOGY, 1999, 111 (2-3): : 297 - 297
  • [4] Characteristics of ZnO:In thin films prepared by RF magnetron sputtering
    Peng, L. P.
    Fang, L.
    Yang, X. F.
    Ruan, H. B.
    Li, Y. J.
    Huang, Q. L.
    Kong, C. Y.
    PHYSICA E-LOW-DIMENSIONAL SYSTEMS & NANOSTRUCTURES, 2009, 41 (10): : 1819 - 1823
  • [5] Carbon nitride thin films prepared by reactive rf magnetron sputtering
    Logothetidis, S
    Lefakis, H
    Gioti, M
    CARBON, 1998, 36 (5-6) : 757 - 760
  • [6] Nanostructure of ZnO thin films prepared by reactive rf magnetron sputtering
    Takai, O
    Futsuhara, M
    Shimizu, G
    Lungu, CP
    Nozue, J
    THIN SOLID FILMS, 1998, 318 (1-2) : 117 - 119
  • [7] Carbon nitride thin films prepared by reactive rf magnetron sputtering
    Logothetidis, S
    Lefakis, H
    Gioti, M
    FULLERENES AND CARBON BASED MATERIALS, 1998, 68 : 757 - 760
  • [8] Characteristics of ZnO/diamond thin films prepared by RF magnetron sputtering
    Park, YW
    Yoon, SJ
    Lee, J
    Baik, YJ
    Kim, HJ
    Jung, HJ
    Choi, WK
    Cho, BH
    Park, CY
    JOURNAL OF THE KOREAN PHYSICAL SOCIETY, 1999, 35 : S517 - S520
  • [9] Preparation of MgO thin films by RF magnetron sputtering
    Kaneko, Yasuhisa, 1600, (30):
  • [10] Structural properties of TiN thin films prepared by RF reactive magnetron sputtering
    Dhanaraj, R.
    Mohamed, S. B.
    Kamruddin, M.
    Kaviyarasu, K.
    Manojkumar, P. A.
    MATERIALS TODAY-PROCEEDINGS, 2021, 36 : 146 - 149
12345