CARBONIZED LAYER FORMATION IN ION IMPLANTED PHOTORESIST MASKS.

被引：0
|
作者：
Orvek, Kevin J. [1 ]
Huffman, Craig [1 ]
机构：
[1] Texas Instruments Inc, Semiconductor, Process & Design Cent, Dallas,, TX, USA, Texas Instruments Inc, Semiconductor Process & Design Cent, Dallas, TX, USA
来源：
Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms | 1985年 / B7-8卷 / pt 2期
关键词：
CARBONIZED LAYER FORMATION - MASKS - SHIPLEY MICROPOSIT 1400-31;
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页码：501 / 506
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