Electrochemical study of atomically flattening process of silicon surface in 40% NH4F solution

被引：0
|
作者：
Research Cent for Photoenergetics of, Organic Materials, Osaka, Japan [1 ]
机构：
来源：
Appl Surf Sci | / 146-150期
关键词：
Number:; -; Acronym:; MEXT; Sponsor: Ministry of Education; Culture; Sports; Science and Technology;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 50 条
  • [21] The preparation of flat H-Si(111) surfaces in 40% NH4F revisited
    Allongue, P
    de Villeneuve, CH
    Morin, S
    Boukherroub, R
    Wayner, DDM
    ELECTROCHIMICA ACTA, 2000, 45 (28) : 4591 - 4598
  • [22] A STUDY ON THE FORMATION OF PEROXODISULFATE ION ON A PLATINUM ANODE IN THE PRESENCE OF NH4F
    TASAKA, A
    IWAMOTO, T
    KIKUTANI, T
    TOJO, T
    DENKI KAGAKU, 1990, 58 (09): : 823 - 829
  • [23] SURFACE-CHEMISTRY OF GAAS TREATED WITH BUFFERED HF AND NH4F SOLUTIONS - SLOW REACTIONS OF PROCESS RESIDUALS
    YOTA, J
    BURROWS, VA
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1992, 10 (04): : 837 - 842
  • [24] NH4F surface modification of Li-rich layered cathode materials
    Li, L.
    Chang, Y. L.
    Xia, H.
    Song, B. H.
    Yang, J. R.
    Lee, K. S.
    Lu, L.
    SOLID STATE IONICS, 2014, 264 : 36 - 44
  • [25] A comparative Raman spectroscopy study on silicon surface in HF, HF/H2O2 and HF/NH4F aqueous solutions
    Wang, J
    Tu, HL
    Zhu, WX
    Zhou, QG
    Liu, AS
    Zhang, C
    MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 2000, 72 (2-3): : 193 - 196
  • [26] Study on titania nanotube arrays prepared by titanium anodization in NH4F/H2SO4 solution
    Tian, Tian
    Xiao, Xiu-feng
    Liu, Rong-fang
    She, Hou-de
    Hu, Xiao-feng
    JOURNAL OF MATERIALS SCIENCE, 2007, 42 (14) : 5539 - 5543
  • [27] The effect of HF/NH4F etching on the morphology of surface fractures on fused silica
    Wong, L.
    Suratwala, T.
    Feit, M. D.
    Miller, P. E.
    Steele, R.
    JOURNAL OF NON-CRYSTALLINE SOLIDS, 2009, 355 (13) : 797 - 810
  • [28] Study on titania nanotube arrays prepared by titanium anodization in NH4F/H2SO4 solution
    Tian Tian
    Xiu-feng Xiao
    Rong-fang Liu
    Hou-de She
    Xiao-feng Hu
    Journal of Materials Science, 2007, 42 : 5539 - 5543
  • [29] The effects of treatment of Si(111) surfaces with NH4F solution on Schottky diode parameters
    Hadjersi, T
    Cheraga, H
    Chergui, W
    APPLIED SURFACE SCIENCE, 2004, 235 (1-2) : 197 - 201
  • [30] In situ infrared observation of etching and oxidation processes on Si surfaces in NH4F solution
    Niwano, M
    Kondo, Y
    Kimura, A
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2000, 147 (04) : 1555 - 1559
12345